When we had to decide to cancel the conference in Frankfurt in order to switch to an online event, it was not easy for us. The personal exchange between customers, interested parties and partners is very important to us. As you know, our corporate philosophy is based to a large extent on precisely this personal and direct contact.
On 17th March, ECHA held a webinar where they introdcued the SCIP database prototype. With more than 250 people listening in, the webinar was very well attended. The prototype of the SCIP database was released a month ago to allow duty holders to familiarize themselves with the process of preparing and submitting dossiers in a test environment.
How have you done so far in the first and hopefully only pandemic of our lives? What a surreal situation! We hope, you are well!
Like many others, the CEO and the team of opesus had to make some difficult decisions and adapt their behavior to the new situation. How do we handle customer appointments? How will we continue to work in the coming weeks? What will happen to the major events we had planned for 2020? We are following the developments around the virus closely and would like to inform you about the measures we have taken to protect everybody’s health as well as keeping up our work.
ChemCon Americas was held in Philadelphia from March 2nd-March 6th. The five-day event was well-attended, bringing together experts from companies, authorities, and organizations.
At a working group meeting of the working group “legally compliant environmental management”, Andreas Müller presented on the ECHA SCIP Database. As the opesus expert on the upcoming SCIP requirements, Andreas covered the regulatory requirements and included tips on how companies can start preparing for the upcoming deadline.
Get ready for SCIP! The opesus EHSM Smart Input (ESI) now supports the new SCIP format. This means you can start to prepare for SCIP requirements by importing the REACH SVHC Candidate List in ESI.
Tested, checked, and released! The latest release of the opesus EHS Product Notification (EPN) software supports update scenarios and integrates system-to-system (S2S) communication. This means that you can submit dossiers for the poison centres directly out of your SAP system.
Since 2013 opesus has been attending the Federal Institute of Risk (BfR) annual user conferences. This year Markus Pogrzeba and Mark Pfister attended the 10th BfR user conference in Berlin. Being the 10th event, it had one of the largest turnouts with about 350 attendees. The focus was the implementation of the harmonized notification obligations according to Annex VIII of the CLP regulation.
opesus was on the road again last week. On Nov 11th, at the meeting of the of the German SAP User Group (DSAG), and the next day, on Nov 12th, at the EHS IT workgroup of the German Chemical Industry Association (VCI). Markus Pogrzeba is the deputy speaker of the DSAG EH&S workgroup. Additionally, he spoke on the latest updates on CLP Art. 45 at the VCI EHS IT workgroup.
At the SAP Sustainability Innovation Days 2019, we shared the stage with Merck. This two-day event on November 5th and 6th brought us the latest news on S/4HANA for Product Compliance & EHS accompanied with several customer presentations.
The SAP EHS and Product Compliance Conference at the SAP HQ in Newtown Square was a highlight this autumn. With around 200 people from all areas of the industry and very well attended presentations and lively discussions, we couldn’t have hoped for more.
Our latest software update for opesus EHSM Smart Input (ESI) comes with some improvements and fixes. The biggest improvement is the addition of our “Compliance Data Object Search”. This makes the search function more powerful and user-friendly as it is now more adaptable to your needs. As part of ESI, the search function will be updated and improved on a continuous basis.
Tested, checked, and released. The opesus EHS Product Notification software creates poison centre dossiers in the Poison Centres Notification (PCN) format.
In other words, you can now create and download dossiers from your SAP system. After that, simply upload the dossier to the ECHA Submission Portal. This way, you fulfill the requirements of Art. 45 and Annex VIII to the CLP regulation for your product portfolio.
On 28 June 2019, the TOP 100 most innovative companies in Germany were honored at the Deutscher Mittelstands Summit (German SME Summit) in the Jahrhunderthalle Frankfurt – and we were there! German TV-Moderator Linda Zervakis led through the entertaining evening. Alongside her, German science journalist and author Ranga Yogeshwar, Hesse’s Minister of Economic Affairs Tarek Al-Wazir, and former Federal President Christian Wulff, the scientific director of the award, Prof. Dr. Nikolaus Franke, spoke at the event.
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Participants at opesus CLP workshop
Our very first event was a huge success! Focused on the topic of CLP Article 45 Poison Centre Notifications for SAP customers and supported by the German Chemical Industry Association (VCI), we had a great turnout of 93 attendees – more than double of what we expected when we started planning a year ago.
Every year at opesus, we pass on the Christmas cheer to those in need. Instead of gifting our customers opesus-branded goodies, we donate to a charity organization in their name. For 2018, opesus donated to the Himalayan Stove Project – an organization that is transforming the lives of residents in mountainous Nepal, one clean cooking stove at a time.
opesus received the Technology Fast 50 Award – for the 3rd time in 3 years
On 22nd and 23rd of October 2018 the CLP conference of the Chem-Academy took place. One of the main topics was “Art. 45 of the CLP Regulation: regulatory requirements and technical implementation “. Alexander Wegener from opesus gave information about the “Technical Implementation of Art. 45 CLP-VO”.
We have released a new version of the opesus UFI Generator for SAP EHSM customers. With the new version, Unique Form Identifiers (UFI) can be generated and stored automatically in SAP EHSM.
opesus just released opesus UFI Generator for SAP® EHSM. All SAP EHSM customers can download it for free under the MIT-License.